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A quantitative determination of oxidative stress was obtained at three time points by measuring Malondialdehyde (MDA) concentrations in peripheral blood before and after the cycle and one month following completion of the cycle. Thirty-two healthy volunteers were treated using the Seqex cycle. This device supplies complex magnetic signals with specific choices of frequency, intensity, and shape that are based on Liboff's ion cyclotron resonance hypothesis. The present study reports on the effects of an ELF magnetic therapy device (Seqex) on oxidative scale in humans. Very few experiments have been performed on humans. Studies performed on animals and plants have shown conflicting effects on the relation between EMF and oxidative stress.

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Knowledge about the relationship between exposure to extremely low- frequency ( ELF) EMF and formation (or neutralization) of free radicals in the living cells is limited. Raggi, Francesco Vallesi, Giuseppe Rufini, Stefano Gizzi, Stefania Ercolani, Enrico Rossi, Ruggero Our investigation emphasizes possible confounding factors conducting cell culture studies related to low-level ELF-EMF exposure due to the existing stray magnetic fields in the ambient environment of laboratory equipment.Д®LF magnetic therapy and oxidative balance. The maximum stray magnetic fields were higher than 3Гўв‚¬вЂ°Г‚ВµT, 20Гўв‚¬вЂ°Г‚ВµT and 75Гўв‚¬вЂ°Г‚ВµT in the CO2 incubator, in water bath and on the laboratory shaker table, respectively, with high variation of spatial distribution and time domain. The results show that the equipment under test may add a considerable ELF magnetic field to the ambient environmental magnetic field or to the intentional exposure to ELF, RF or other physical/chemical agents. Long- and short-term variation of stray magnetic field was also evaluated under normal use of investigated laboratory devices. Spatial distributions of magnetic field time domain signal waveform and frequency spectral analysis (FFT) were processed. These devices usually have electric motors, heating wires and electronic control systems, therefore may expose the cell cultures to undesirable ELF stray magnetic fields. Three types of device were evaluated: a cell culture CO2 incubator, a thermostatic water bath and a laboratory shaker table. Measurements of extremely low frequency ( ELF) magnetic fields were conducted in the environment of commercial laboratory equipment in order to evaluate the possible co-exposure during the experimental processes on cell cultures. Gresits, IvГѓВЎn Necz, PГѓВ©ter PГѓВЎl JГѓВЎnossy, GГѓВЎbor ThurГѓВіczy, GyГѓВ¶rgy PMID:29614730Д®xtremely low frequency ( ELF) stray magnetic fields of laboratory equipment: a possible co-exposure conducting experiments on cell cultures.

In conclusion, ELF-MF exposure among workers can be substantially affected by the type of operation and job, and the activity or location. The groups with the highest quartile ELF-MF exposure level are operators in diffusion, ion implantation, module and testing operations, and maintenance engineers in diffusion, module and testing operations. The ELF-MF exposures of process operators were found to be higher than those of maintenance engineers, although peak exposure and/or patterns varied. Workers engaged in the diffusion and chip testing activities showed the highest ELF-MF exposure. Exposure to ELF-MF differed among types of factory, operation, job and activity. The average levels of ELF-MF exposure were 0.56 Г‚ВµT for fab workers, 0.59 Г‚ВµT for chip packaging workers and 0.89 Г‚ВµT for electrical engineers, respectively. ELF-MF exposure of workers were classified based on the quartiles of ELF-MF distribution. All measurements were categorized by operation, job and working activity during working time.

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A portable device was used to monitor ELF-MF in high temporal resolution.

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These were demonstrated by assessing the exposure of 117 workers involved in wafer fabrication (fab) and chip packaging wearing personal dosimeters for a full shift. We assessed the exposure of semiconductor workers to extremely low frequency-magnetic fields ( ELF-MF) and identified job characteristics affecting ELF-MF exposure. Extremely Low Frequency-Magnetic Field ( ELF-MF) Exposure Characteristics among Semiconductor WorkersД¬hoi, Sangjun Cha, Wonseok Kim, Won Yoon, Chungsik Park, Ju-Hyun Ha, Kwonchul Park, Donguk